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INDEPENDENT AND SYNERGIC INHIBITION OF VERAPAMIL AND ELECTRIC BEAM RADIATION ON CLONOGENIC GROWTH IN K562 AND K562/ADM CELL LINES IN VITRO

  
@article{CJCR2592,
	author = {Zuofu Xie and Shiren Shen},
	title = {INDEPENDENT AND SYNERGIC INHIBITION OF VERAPAMIL AND ELECTRIC BEAM RADIATION ON CLONOGENIC GROWTH IN K562 AND K562/ADM CELL LINES IN VITRO},
	journal = {Chinese Journal of Cancer Research},
	volume = {7},
	number = {1},
	year = {2013},
	keywords = {},
	abstract = {It was first reported here that verapamil (VP) and electric beam radiation (EBR) were capable of inhibiting, independently or synergically, clonogenic growth in two kinds of K562 cell lines, adriamycin (ADM)-sensitive and ADM-resistant (K562/S and K562/ADM). Results showed that clonogenic rate (CGR) decreased by 3%-99.9% in the presence of dependent dose-ADM (3.8μg/ml) in K562/ADM cell lines, while treated with 0.5μM-61μM of VP. VP was capable of potentiating radiosensitivity in K562/S and K562/ADM cell lines, whether before or after exposure of them to electric beam radiation, and significantly reduced CGR in these kinds of cell lines (P},
	issn = {1993-0631},	url = {https://cjcr.amegroups.org/article/view/2592}
}